From Molecule to Material and back: Impacts of the Precursor Structure and Ligand Choice on the Composition and Properties of Thin Films grown by Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD)
讲座名称：
From Molecule to Material and back: Impacts of the Precursor Structure and Ligand Choice on the Composition and Properties of Thin Films grown by Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD)
讲座时间：
2016-04-22
讲座人：
Jean-Sebastien Lehn
形式：
校区：
兴庆校区
实践学分：
讲座内容：
From Molecule to Material and back: Impacts of the Precursor Structure and Ligand Choice on the Composition and Properties of Thin Films grown by Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD)
Speaker： Dr. Jean-Sebastien Lehn
Time： 09:00a.m, Apr. 22 (Friday)
Location： Room 205, School of Materials Science and Engineering
Abstract:
In this presentation, Dr Lehn will introduce the basics of CVD (Chemical Vapor Deposition) and ALD(Atomic Layer Deposition), and will focus on the requirements on precursors for either deposition method. He will highlight several nitrogen-based ligand platforms. Finally, he will show how failed experiments can lead to valuable learnings if enough time is devoted to understanding the negative results.
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