姓名： Prof. Hisao Ishii
简介： Prof. Hisao Ishii received his MS and Ph.D. degrees in chemistry from the University of Tokyo, in 1988 and 1991, respectively.His thesis research focused on the metastable atom electron spectroscopy of clean and adsorbate-covered silicon surfaces. In 1991, he started to investigate the film and interface electronic structure of organic semiconductors at Nagoya University as an assistant professor. In 2002, he was promoted to associate professor in Research Institute of Electrical Communication, Tohoku University, to extend his research to organic device physics. Now, he has been working for Chiba University since 2006 as a professor. His current research interests include photoelectron spectroscopy of functional organic materials,electronic structure of organic/inorganicinterfaces, and molecular orientation of thin organic films. His efforts are also focusing on developing new techniques such as photoelectron yield spectroscopy, high-sensitivity photoelectron spectroscopy and rotary Kelvin probe, etc.